Parallel optical nanolithography using nanoscale bowtie aperture array
نویسندگان
چکیده
منابع مشابه
Parallel optical nanolithography using nanoscale bowtie aperture array.
We report results of parallel optical nanolithography using nanoscale bowtie aperture array. These nanoscale bowtie aperture arrays are used to focus a laser beam into multiple nanoscale light spots for parallel nano-lithography. Our work employed a frequency-tripled diode-pumped solid state (DPSS) laser (lambda = 355 nm) and Shipley S1805 photoresist. An interference-based optical alignment sy...
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We report optical parallel nanolithography using bowtie apertures with the help of the interferometricspatial-phase-imaging (ISPI) technique. The ISPI system can detect and control the distance between the bowtie aperture, and photoresist with a resolution of sub-nanometer level. It overcomes the difficulties brought by the light divergence of bowtie apertures. Parallel nanolithography with fea...
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We demonstrate that bowtie apertures can be used for contact lithography to achieve nanometer scale resolution. The bowtie apertures with a 30 nm gap size are fabricated in aluminum thin films coated on quartz substrates. Lithography results show that holes of sub-50-nm dimensions can be produced in photoresist by illuminating the apertures with a 355 nm laser beam polarized in the direction ac...
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C-shaped ridge apertures are used in contact nanolithography to achieve nanometer scale resolution. Lithography results demonstrated that holes as small as 60 nm can be produced in the photoresist by illuminating the apertures with a 355 nm laser beam. Experiments are also performed using comparable square and rectangular apertures. Results show enhanced transmission and light concentration of ...
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ژورنال
عنوان ژورنال: Optics Express
سال: 2010
ISSN: 1094-4087
DOI: 10.1364/oe.18.007369